Conductive substrate and electronic device comprising same

ABSTRACT

Disclosed are an electric conducting substrate, comprising a transparent substrate and an electric conducting pattern comprising an electric conducting line provided on the transparent substrate, and an electronic device comprising the same.

TECHNICAL FIELD

This application claims priority to Korean Patent Application No.10-2011-0141747, filed in the Korean Intellectual Property Office onDec. 23, 2011, the entire contents of which are incorporated herein byreference.

The present invention relates to an electric conducting substrate and anelectronic device comprising the same. In particular, the presentinvention relates to an electric conducting substrate having excellentelectric conductivity and not obstructing a view and an electronicdevice comprising the same.

BACKGROUND ART

Recently, as distribution of smart phones, and tablet PCs, IPTVs, andthe like has accelerated, requirement for a touch function in which ahand of human directly becomes an input device without requiring aseparate input device such as a keyboard or a remote controller hasgradually increased. Further, a writable multi-touch function has beenadditionally required in addition to a specific point touch function.

A touch panel having the functions may be classified as followsaccording to a signal detecting method.

That is, the touch panels are divided into a resistive type detecting aposition pressed by a pressure through a change in a current or voltagevalue in a state where DC voltage is applied, a capacitive type usingcapacitance coupling in a state where AC voltage is applied, and anelectromagnetic type detecting a selected position as a change involtage in a state where a magnetic field is applied.

Among the types, the most common resistive type and capacitive typetouch panels recognize a touch or not according to an electrical touchor a change of capacitance by using a transparent conductive film suchas an ITO film. However, most of the transparent conductive films havehigh resistance of 150 ohm/square or more, and sensitivity whenincreasing a size deteriorates. In addition, as a size of a screen isincreased, costs of the ITO film rapidly increase, and as a result,commercialization is not easy. In order to solve the problem, an attemptto implement a large size by using a metal pattern having high electricconductivity is being made. However, in the case of the metal patternhaving high electric conductivity, there is a problem in that a view isobstructed.

DETAILED DESCRIPTION OF THE INVENTION Technical Problem

As described above, the present invention is accomplished afterresearches of a solution for preventing a view from being obstructedwhen configuring an electric conducting substrate using a metal patternare repetitively conducted.

Technical Solution

An exemplary embodiment of the present invention provides an electricconducting substrate, comprising:

a transparent substrate and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate,

in which the electric conducting pattern comprises cells closed by theelectric conducting line,

a 0.5-squared value of an area of the cell is defined as acharacteristic length (Lc) of the cells, and

when a graph 1 representing the following Formula 1 and a graph 2representing the following Formula 2 are illustrated by setting anaverage of characteristic lengths (Lc_(av)) of the cells as an X axisand setting a line width (W) of the electric conducting line as a Yaxis, the line width (W) of the electric conducting line and the averageof characteristic lengths (Lc_(av)) of the cells are comprised in acrossing region of a lower region of the graph 1 and a lower region ofthe graph 2:

W=[(1/AR ^(0.5))−1]Lc _(av)  [Formula 1]

W=13exp(−0.0052Lc _(av))+α  [Formula 2]

in Formulas 1 and 2,

W is a line width of the electric conducting line, and

Lc_(av) is an average of characteristic lengths of cells closed by theelectric conducting line,

AR is an aperture ratio of the electric conducting pattern, and

α is a constant.

Another exemplary embodiment of the present invention provides anelectric conducting substrate, comprising:

a transparent substrate and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate,

in which the electric conducting pattern comprises cells closed by theelectric conducting line,

a characteristic length (Lc) of the cells defined by a 0.5-squared valueof an area of the cell satisfies the following Formula 3:

Y ₁ /n≦Lc≦2Y ₂  [Formula 3]

in Formula 3,

n is the number of subpixels arranged in one direction in each pixel ofthe display to which the electric conducting substrate is applied, and

Y₁ and Y₂ are represented by the following formulas, respectively.

Y ₁=(2.9Q+68.1)×1 μm/1 inch

Y2=(13.3Q+98.1)×1 μm/1 inch

in the formulas, Q is a diagonal length (inch) of an effective screenpart of the display to which the electric conducting substrate isapplied.

Another exemplary embodiment of the present invention provides anelectric conducting substrate, comprising:

a transparent substrate and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate,

in which the electric conducting pattern comprises cells closed by theelectric conducting line,

a characteristic length (Lc) of the cells defined by a 0.5-squared valueof an area of the cell satisfies the following Formula 4:

Lp/n≦Lc≦2Lp  [Formula 4]

in Formula 4,

n is the number of subpixels arranged in one direction in each pixel ofthe display to which the electric conducting substrate is applied, and

Lp is a characteristic length of the pixel defined by a 0.5-squaredvalue of an area of each pixel of the display to which the electricconducting substrate is applied.

Another exemplary embodiment of the present invention provides anelectric conducting substrate, comprising:

a transparent substrate and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate,

in which a line width (W) of the electric conducting line satisfies thefollowing Formula 6:

0.03Y ₃ ≧W  [Formula 6]

in Formula 6,

W is a line width of the electric conducting line, and

Y₃ is a real number within a range of Y₁≦Y₃≦Y₂, and here, Y₁ and Y₂ arerepresented by the following formulas, respectively.

Y ₁=(2.9Q+68.1)×1 μm/1 inch

Y ₂=(13.3Q+98.1)×1 μm/1 inch

in the formulas, Q is a diagonal length (inch) of an effective screenpart of the display to which the electric conducting substrate isapplied.

Another exemplary embodiment of the present invention provides anelectric conducting substrate, comprising:

a transparent substrate and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate,

in which a line width (W) of the electric conducting line satisfies thefollowing Formula 7:

0.03Lp≧W  [Formula 7]

in Formula 7,

W is a line width of the electric conducting line, and

Lp is a characteristic length of the pixel defined by a 0.5-squaredvalue of an area of each pixel of the display to which the electricconducting substrate is applied.

Another exemplary embodiment of the present invention provides anelectric conducting substrate, comprising:

a transparent substrate and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate,

in which a line width (W) of the electric conducting line satisfies thefollowing Formula 9:

3Y ₃/(100×10^(1/2))≧W  [Formula 9]

in Formula 9,

W is a line width of the electric conducting line, and

Y₃ is a real number (μm) within a range of Y₁≦Y₃≦Y₂, and here, Y₁ and Y₂are represented by the following formulas, respectively.

Y ₁=(2.9Q+68.1)×1 μm/1 inch

Y ₂=(13.3Q+98.1)×1 μm/1 inch

in the formulas, Q is a diagonal length (inch) of an effective screenpart of the display to which the electric conducting substrate isapplied.

Further, another exemplary embodiment of the present invention providesan electric conducting substrate, comprising:

a transparent substrate and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate,

in which a line width (W) of the electric conducting line satisfies thefollowing Formula 10:

3Lp/(100×10^(1/2))≧W  [Formula 10]

in Formula 10,

W is a line width of the electric conducting line, and

Lp is a characteristic length (μm) of the pixel defined by a 0.5-squaredvalue of an area of each pixel of the display to which the electricconducting substrate is applied.

Further, another exemplary embodiment of the present invention providesan electric conducting substrate, comprising:

a transparent substrate and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate, in whicha visible line width (W_(v)) of the electric conducting line satisfiesthe following Formula 12 and is more than 0 to 3.6 μm or less:

W _(v) =W×R _(m)  [Formula 12]

in Formula 12,

W is a line width of the electric conducting line, and

R_(m) is reflectivity of an electric conducting line materialconfiguring the electric conducting pattern.

Further, another exemplary embodiment of the present invention providesan electronic device comprising the electric conducting substrate.

Further, another exemplary embodiment of the present invention providesa display device comprising the electric conducting substrate.

Advantageous Effects

According to the present invention, in the case of using a correlationof an average of a characteristic length of a cell closed by an electricconducting line and a line width of an electric conducting line, anelectric conducting substrate having excellent electric conductivity andnot obstructing a view may be provided. As a result, like a touch panelor an OLED illumination, the electric conducting substrate may be usefulin an electronic device in which securing a view is important.

Further, according to the present invention, since a pitch according toa pixel of a display may be derived from a diagonal length (inch) of aneffective screen part of the display and as a result, a pitch and a linewidth according to a pixel of a metal mesh pattern may be derived, aviewing characteristic of the electric conducting pattern may be moreeffectively improved by controlling a relationship between the linewidth, the pitch, and the like of the metal mesh pattern and the pixelpitch and the like of the display.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 illustrates allowable regions of a line width (W) of an electricconducting line and an average of characteristic lengths of cells closedby the electric conducting line which are defined by graphs of Formula 1and Formula 2 defined in the present invention according to an apertureratio.

FIG. 2 is a diagram illustrating pixels and subpixels of a displayaccording to an exemplary embodiment of the present invention.

FIG. 3 is a diagram illustrating a correlation of a pixel pitch to adiagonal length (inch) of an effective screen part in the displayaccording to the exemplary embodiment of the present invention.

FIG. 4 is a diagram schematically illustrating non-uniformity of mixedcolors of pixels in the display according to the exemplary embodiment ofthe present invention.

FIG. 5 is a diagram schematically illustrating a region where thedisplay is covered according to a metal mesh pattern according to theexemplary embodiment of the present invention.

FIGS. 6 and 7 illustrate a process of forming an electric conductingpattern of a touch panel according to the present invention.

FIGS. 8 and 9 are diagrams illustrating electric conducting patternsaccording to Example of the present invention and Comparative Example.

FIG. 10 is a diagram illustrating a configuration and a scheme of anapparatus for measuring reflectivity in a bright room according to anexemplary embodiment of the present invention.

FIG. 11 is a diagram schematically illustrating a correlation of avisible line width according to an exemplary embodiment of the presentinvention.

FIG. 12 is a diagram illustrating definition of a cycle per degree (CPD)according to an exemplary embodiment of the present invention.

FIG. 13 is a diagram illustrating a visual function depending on a CPDaccording to an exemplary embodiment of the present invention.

BEST MODE

Hereinafter, the present invention will be described in more detail.

An electric conducting substrate according to the present invention isan electric conducting substrate comprising a transparent substrate andan electric conducting pattern comprising an electric conducting lineprovided on the transparent substrate,

in which the electric conducting pattern comprises cells closed by theelectric conducting line,

a 0.5-squared value of an area of the cell is defined as acharacteristic lengths (Lc) of the cells, and

when a graph 1 representing the following Formula 1 and a graph 2representing the following Formula 2 are illustrated by setting anaverage of characteristic lengths (Lc_(av)) of the cells as an X axisand setting a line width (W) of the electric conducting line as a Yaxis, the line width (W) of the electric conducting line and the averageof characteristic lengths (Lc_(av)) of the cells are comprised in acrossing region of a lower region of the graph 1 and a lower region ofthe graph 2.

W=[(1/AR ^(0.5))−1]Lc _(av)  [Formula 1]

W=13exp(−0.0052Lc _(av))+α  [Formula 2]

In Formulas 1 and 2,

W is a line width of the electric conducting line,

Lc_(av) is an average of characteristic lengths of cells closed by theelectric conducting line,

AR is an aperture ratio of the electric conducting pattern, and

α is a constant.

In the related art, as an electric conducting pattern used in anelectronic device, a pattern having a simple shape such as a stripeshape or a mesh shape is frequently used, but recently, an attempt touse an electric conducting substrate using an electric conductingpattern having various shapes in the electronic device for avoidingmoire and the like is being made.

However, as the shape of the electric conducting pattern is various, areference for decreasing visibility of the electric conducting patterncannot be found in a use in which securing a view is largely requiredlike a touch panel.

Further, in the case of unlimitedly increasing the aperture ratio of theelectric conducting pattern or unlimitedly decreasing the line width ofthe electric conducting line, there are problems in that it is difficultto reach such a scale due to a manufacturing technique, costs arelargely increased, and other physical properties required for thecorresponding device such as electric conductivity are not satisfied.

The present invention was derived based on the found fact thatvisibility of the electric conducting pattern does not simply depend ononly one or two conditions such as an aperture ratio or a width of theelectric conducting line, but depends on various conditions such as ashape, a size, and an aperture ratio of the electric conducting patternand a line width of the electric conducting line and a distance betweenlines. Accordingly, if the electric conducting pattern comprises cellsclosed by the electric conducting line, the present invention mayprovide an electric conducting pattern which does not obstruct a view,by controlling an aperture ratio or a line width of the electricconducting line within a predetermined range, regardless of a shape ofthe electric conducting pattern.

In the present invention, the characteristic length (Lc) of the cellclosed by the electric conducting line was defined as the 0.5-squaredvalue of the area of the cell. By defining the characteristic length asdescribed above, as long as the electric conducting pattern comprisesthe cells closed by the electric conducting line, conditions forconfiguring the electric conducting pattern not obstructing the view maybe derived regardless of a shape of the electric conducting pattern. Thecharacteristic length of the cell may become an index of a shape and asize of the electric conducting pattern and a distance between the linesof the electric conducting line which influence visibility of theelectric conducting pattern.

In the present invention, the following Formula 1 is a formula between acharacteristic length of the cell and a width of the electric conductingline according to an aperture ratio.

W=[(1/AR ^(0.5))−1]×Lc _(av)  [Formula 1]

Meanwhile, in the present invention, in addition to the condition ofFormula 1, as a formula determining visibility, Formula 2 representing arelationship between a characteristic length of the cell and a width ofthe electric conducting line was derived.

W=13exp(−0.0052Lc _(av))+α  [Formula 2]

In the present invention, visibility of the electric conducting patternmay be clearly secured by satisfying both the condition of the lowerregion of the graph of Formula 1 and the condition of the lower regionof the graph of Formula 2.

In Formula 2, α, which is a constant determined according to a processmaterial or condition, may be generally determined as a real number of 0to 2, and for example, may be 2.

FIG. 1 illustrates the allowable regions of a line width (W) of aelectric conducting line and an average value of characteristic lengths(Lc_(av)) of cells closed by the electric conducting line which aredefined by graphs of Formula 1 and Formula 2 according to an apertureratio. The electric conducting substrate which does not obstruct theview may be provided by determining the line width (W) of the electricconducting line and the average of characteristic lengths (Lc_(av)) ofcells closed by the electric conducting line in a lower overlappedregion of two graphs illustrated in FIG. 1.

The electric conducting substrate is comprised in the scope of thepresent invention as long as satisfying the aforementioned conditions ofFormula 1 and Formula 2, but hereinafter, more preferable conditionswill be described.

In the present invention, a user will define a relationship between aline width and a pitch of the metal mesh line according to a diagonallength (inch) of an effective screen part of the display for shielding ametal line of the touch panel made of metals while maintainingperformance of the display in connection with reflectivity of a materialconfiguring the metal, when the touch panel adopted to the display isconfigured by a minute metal mesh line.

In the case of a touch panel using an existing metal mesh pattern, asthe most important factor to configure the touch panel using the metalmesh pattern, a technique of reducing visibility of lines by refining aline width of the metal mesh pattern has been frequently used. However,in the case of the refinement technique of the line width, as thevisibility of lines is varied by a distance of a pitch corresponding tothe distance between lines configuring the mesh pattern in addition tothe reduction of the line width, selection of an appropriate pitch forthe varied visibility is required. In addition, finally, as the size ofthe pitch has a correlation with an optical characteristic such as moireor transmittance, freedom in the degree of a design by a manufacturerdeteriorates when manufacturing the touch panel using a mesh pattern.

In order to overcome the above shortcomings, in the present invention,an appropriate pitch according to a diagonal length of the effectivescreen part of the display was first set. Further, in order to solve thevisibility problem of the line which may occur in an existing inventionaccording to the pitch, the visibility of the line is changed bycontrolling reflectivity of metal, thereby minimizing the correlationbetween the pitch and the line width. Further, accordingly, when thetouch panel is manufactured, a method of maximally shielding the lineand freely setting a pitch in the moire or transmittance is suggested toa user.

In general, in the display, a size of a pixel is defined according to adistance at which a person views the display. In this case, the pixelmeans a set of subpixels constituted by R/G/B, and since shapes of mostof pixels are close to a square, a pitch of the pixel means a size ofthe pixel. Currently, the pixel used in the display generally has apixel size of about 75 μm in the case of a mobile, about 150 μm in thecase of a model such as a tablet or laptop computer and a monitor, andabout 200 μm in the case of a TV model, according to a use distance.Hereinafter, FIG. 2 illustrates pixels and subpixels of a displayaccording to an exemplary embodiment of the present invention.

As described above, in the display, a pitch of the pixel is generallydefined according to an average distance at which people use thedisplay. For example, in an LCD, since it is assumed that a pitch of thepixel of the display has generally a square shape, the pitch of thepixel of the display may be inferred through information onspecification of the display.

First, a pitch of the pixel inferred through a pixel per inch (PPI)displayed in the display is as follows.

The PPI generally means the number of pixels comprised within a diagonallength of 1 inch of the effective screen part of the display.Accordingly, assuming that the PPI represented in the display is 200,since the case means that about 200 pixels exist within 1 inch, it maybe understood that the pitch of the pixel is P_(pixel)=2.54cm/200=0.0127 cm, that is, a pitch of the pixel of about 127 μm. Ifthere is no information on the PPI, the PPI may be calculated by anumber designated in resolution, and in the case where information onthe display is represented like WXGA, 1280×800 corresponding the WXGAcorresponds to information from which the PPI may be inferred. Inaddition, the PPI may be inferred through a maximum resolutioninformation value represented by various methods. As one example, in thecase where information designated in resolution is A×B, when a diagonalinch represented in the corresponding display is I, (A²+B²)^(1/2)corresponds to the number of pixels positioned at the diagonal of thedisplay, and as a result, (A²+B²)^(1/2)/I corresponds to the PPI. Thatis, the pixel pitch of this case may be represented by P_(pixel)=2.54cm×I/(A²+B²)^(1/2).

In summary, a pitch P_(pixel) of the pixel may be represented by thefollowing Equation 1.

P _(pixel)=2.54 cm/PPI=2.54 cm(I/(A ² +B ²)^(1/2))  [Equation 1]

In Equation 1,

A represents maximum resolution in a horizontal direction of thedisplay, and B represents maximum resolution in a vertical direction ofthe display.

Products which are mainly distributed in a current market were examinedby a result of converting a pixel size of a product by using theaforementioned PPI or resolution. As a result, it may be verified thatdisplays that have various pixel pitches up to a level range of 77 to200 μm in the case of a mobile are mainly adopted, and displays havinglevels of 170 to 240 μm in the case of a laptop computer, 250 to 300 μmin the case of a monitor, and 230 to 635 μm in the case of a TV aremainly adopted.

On the basis of the result, the present inventors derived a correlationof a pixel pitch to a diagonal length (inch) of an effective screen partin the display, and the derived result is illustrated in FIG. 3.

Through the range of the pixel pitch according to the diagonal length ofthe effective screen part in the display presented above, in the presentinvention, a range of a pitch of the metal mesh pattern may be definedthrough the following analysis. First, when it is assumed that a statein which the mesh pattern does not rotate is most preferable in the casewhere the metal mesh pattern is mounted on the display, since only onemesh line or cross point of the mesh per one pixel is positioned, amixed color of the pixels in the display is uniformly maintained. Whenbroadly interpreting the viewpoint, although it is considered that thepixel of the display is generally constituted by three subpixels havinga length ratio of about 3:1, and in the case of an OLED, the pixel isconstituted by four subpixels in a pentile mode, basically, in the caseof introducing a pitch of the mesh pattern 0.25 times or less of a pitchregion of the aforementioned pixel, non-uniformity of local mixed colorsof pixels may occur by the line width of the mesh pattern or a crosspoint of the mesh pattern (because a region where pixel coveringfrequently occurs exists), and therefore the pitch of the mesh patternis set to preferably 0.25 times or more of the pitch of the pixel.Furthermore, in the case where the pitch of the metal mesh pattern isset to the pitch of the pixel or more, when the pitch of the metal meshpattern is set to 2 times or more of the pitch of the pixel, sincepixels covered by line components of the metal mesh pattern and pixelsnot covered by line components are alternately shown as illustrated inFIG. 4, non-uniformity of the entire mixed colors may occur.

Accordingly, the present inventors introduced a pitch that the metalmesh pattern of the touch panel is required to have in the correspondingdisplay.

An electric conducting substrate according to the present invention isan electric conducting substrate comprising a transparent substrate andan electric conducting pattern comprising an electric conducting lineprovided on the transparent substrate,

in which the electric conducting pattern comprises cells closed by theelectric conducting line, and

a characteristic length (Lc) of the cells defined by a 0.5-squared valueof an area of the cell satisfies the following Formula 3.

Y ₁ /n≦Lc≦2Y ₂  [Formula 3]

In Formula 3,

n is the number of subpixels arranged in one direction in each pixel ofthe display to which the electric conducting substrate is applied,

Y₁ and Y₂ are represented by the following formulas, respectively.

Y ₁=(2.9Q+68.1)×1 μm/1 inch

Y ₂=(13.3Q+98.1)×1 μm/1 inch

In the formulas, Q is a diagonal length (inch) of an effective screenpart of the display to which the electric conducting substrate isapplied.

Further, an electric conducting substrate according to the presentinvention is an electric conducting substrate comprising a transparentsubstrate and a electric conducting pattern comprising an electricconducting line provided on the transparent substrate,

in which the electric conducting pattern comprises cells closed by theelectric conducting line, and

a characteristic length (Lc) of the cells defined by a 0.5-squared valueof an area of the cell satisfies the following Formula 4.

Lp/n≦Lc≦2Lp  [Formula 4]

In Formula 4,

n is the number of subpixels arranged in one direction in each pixel ofthe display to which the electric conducting substrate is applied, and

Lp is a characteristic length of the pixel defined by a 0.5-squaredvalue of an area of each pixel of the display to which the electricconducting substrate is applied.

Further, in the present invention, the characteristic length (Lc) of thecells may satisfy the following Formula 5.

P _(pixel 1) /n≦Lc≦2P _(pixel 2)  [Formula 5]

In Formula 5,

n is the number of subpixels arranged in one direction in each pixel ofthe display to which the electric conducting substrate is applied, and

P_(pixel 1) is a pitch of a short width of each pixel of the display towhich the electric conducting substrate is applied, and P_(pixel 2) is apitch of a long width of each pixel of the display to which the electricconducting substrate is applied.

In addition to the introduction of the pitch of the metal mesh patterndefined above, the important part may be a part regarding the line widthof the mesh pattern. In general, the pixel of the display is constitutedby three subpixels as illustrated in FIG. 5, and in this case, thepixels are covered most when lines of the mesh pattern are disposed in adiagonal line of each subpixel, and inversely, the pixels are coveredleast when the pixel is covered to be parallel to a short side of eachsubpixel. Accordingly, from the viewpoint, an opening area may becalculated as follows again according to a line width of the metal meshpattern when the display is covered.

As described above, since a size of the pixel according to the displayis P_(pixel)=2.54 cm/PPI=2.54 cm×I/(A²+B²)^(1/2), opening areas ascompared with before covering the pixel in each case may be representedby (P² _(pixel)−P×W)/P² _(pixel) and (P_(pixel)−10^(1/2)×P×W)²/P²_(pixel), respectively. In this case, generally, in order that people donot recognize the mixed color, a difference in an aperture ratio needsto be within about 3%. Therefore, a correlation between the pitch of thepixel of the display and the line width of the metal mesh pattern of thetouch panel was derived on the basis thereof.

An electric conducting substrate according to the present invention isan electric conducting substrate comprising a transparent substrate andan electric conducting pattern comprising an electric conducting lineprovided on the transparent substrate, in which a line width (W) of theelectric conducting line satisfies the following Formula 6.

0.03Y ₃ ≧W  [Formula 6]

In Formula 6,

W is a line width of the electric conducting line,

Y₃ is a real number within a range of Y₁≦Y₃≦Y₂, and here, Y₁ and Y₂ arerepresented by the following formulas, respectively.

Y ₁=(2.9Q+68.1)×1 μm/1 inch

Y ₂=(13.3Q+98.1)×1 μm/1 inch

In the formulas, Q is a diagonal length (inch) of an effective screenpart of the display to which the electric conducting substrate isapplied.

Further, an electric conducting substrate according to the presentinvention is an electric conducting substrate comprising a transparentsubstrate and an electric conducting pattern comprising an electricconducting line provided on the transparent substrate, in which a linewidth (W) of the electric conducting line satisfies the followingFormula 7.

0.03Lp≧W  [Formula 7]

In Formula 7,

W is a line width of the electric conducting line, and

Lp is a characteristic length of the pixel defined by a 0.5-squaredvalue of an area of each pixel of the display to which the electricconducting substrate is applied.

Further, a line width (W) of the electric conducting line satisfies thefollowing Formula 8.

0.03P _(pixel) ≧W  [Formula 8]

In Formula 8,

W is a line width of the electric conducting line, and

P_(pixel) is a pitch of each pixel of the display to which the electricconducting substrate is applied.

Further, an electric conducting substrate according to the presentinvention is an electric conducting substrate comprising a transparentsubstrate and an electric conducting pattern comprising an electricconducting line provided on the transparent substrate,

in which a line width (W) of the electric conducting line satisfies thefollowing Formula 9.

3Y₃/(100×10^(1/2))≧W  [Formula 9]

In Formula 9,

W is a line width of the electric conducting line, and

Y₃ is a real number (μm) within a range of Y₁≦Y₃≦Y₂, and here, Y₁ and Y₂are represented by the following formulas, respectively.

Y ₁=(2.9Q+68.1)×1 μm/1 inch

Y ₂=(13.3Q+98.1)×1 μm/1 inch

In the formulas, Q is a diagonal length (inch) of an effective screenpart of the display to which the electric conducting substrate isapplied.

Further, an electric conducting substrate according to the presentinvention is an electric conducting substrate comprising a transparentsubstrate and an electric conducting pattern comprising an electricconducting line provided on the transparent substrate,

in which a line width (W) of the electric conducting line satisfies thefollowing Formula 10:

3Lp/(100×10^(1/2))≧W  [Formula 10]

In Formula 10,

W is a line width of the electric conducting line, and

Lp is a characteristic length (μm) of the pixel defined by a 0.5-squaredvalue of an area of each pixel of the display to which the electricconducting substrate is applied.

Further, a line width (W) of the electric conducting line may satisfythe following Formula 11.

3P _(pixel)/(100×10^(1/2))≧W  [Formula 11]

In Formula 11,

W is a line width of the electric conducting line, and

P_(pixel) is a pitch of each pixel of the display to which the electricconducting substrate is applied.

Generally, the display makes white and black by mixing three colors ofR, G, and B to display images. From the viewpoint, the most importantpart may be a part regarding visibility of the metal mesh pattern in ablack state. The reason that the visibility of the metal mesh pattern inthe black state is important may be because the black state is definedas the most basic state in the case of an LCD, and even in a screen,expression of a black color has the very important effect on a contrastratio which is the most important factor of image quality of thedisplay. From the viewpoint, the visibility in the black state of themetal line configuring the metal mesh pattern may be the most importantfactor, and a factor influencing the visibility of the metal line hasvery large correlation with not only a physical line width of the metalbut also reflectivity of a material constituting the metal. In thepresent invention, from the viewpoint, a concept of a new visible linewidth comprising not only a physical line width in the related art butalso reflectivity of a material constituting the metal line is definedas follows.

In the present invention, a visible line width (W_(v)) of the electricconducting line satisfies the following Formula 12.

W _(v) =W×R _(m)  [Formula 12]

In Formula 12,

W is a line width of the electric conducting line, and

R_(m) is reflectivity of an electric conducting line materialconfiguring the electric conducting pattern.

From the viewpoint of reflectivity, when a pitch of a pixel of thedisplay is P_(pixel) a line width of the mesh pattern is W, reflectivityof the mesh pattern material is R_(m), and bright room reflectivity ofthe display panel in a display off mode to which the mesh pattern isapplied is a, total reflectivity of the display comprising the metalmesh pattern may be represented by the following formula.

P _(pixel) ×W×R _(m)+(P ² _(pixel) −P×W)×a

In the case of being indistinguishable by the naked eye, when anabsolute value of [b₁/b₀−1] is b, bright room reflectivity of a displaypanel with the electric conducting pattern in the display off mode isb₁, and bright room reflectivity of only a display panel where theelectric conducting pattern is not provided in the display off mode isb₀, the formula may be summarized by the following formula.

(1−b)×a×P ² _(pixel) ≦P _(pixel) ×W×R _(m)+(P ² _(pixel)−P×W)×a≦(1+b)×a×P ² _(pixel)

The formula is summarized as follows.

a×(W−b×P _(pixel))≦W×R _(m) ≦a×(W+b×P _(pixel))

In this case, since W×R_(m) may be substituted with the visible linewidth (W_(v)) summarized in Formula 12 and a value of the visible linewidth is 0 or more, finally, the following Formula 13 may be derived.

a×(W−b×P _(pixel))≦W×R _(m) ≦a×(W+b×P _(pixel))  [Formula 13]

Further, from Formula 13, since 0≦(W−b×P_(pixel)), Formula 13 has arelationship of b≦W/P_(pixel).

In Formula 13, a may be 0.11 or less, but is not limited thereto.Further, b may be 0.03 or less and 0.115 or less, but is not limitedthereto.

In the present invention, the visible line width (W_(v)) according toFormula 13 may be more than 0 to 3.6 μm or less and more than 0 to 2.4μm or less, but is not limited thereto.

In the present invention, the bright room reflectivity is a valueobserved by measuring only reflectivity of a surface to be measuredafter reflectance of an opposite surface of a surface to measurereflectance is set to 0 by using a black paste, a tape, or the like, andin this case, as an inputted light source, a diffuse light source themost similar to an ambient light condition was selected. Further, inthis case, a measurement position where the reflectance was measured wasbased on a position inclined at about 7 degrees from a vertical line ofa semicircle of an integrating sphere. The following FIG. 10 illustratesa configuration and a scheme of an apparatus for measuring thereflectance as describe above.

As illustrated in the following FIG. 11, when a ratio of a width and alength of a screen is 16:9, a height of the screen is h, a diagonallength is d, a viewing angle at which a user views the display is a, ahorizontal length of the screen is w, and a viewing distance betweeneyes and the screen is D,

w=D×tan(a/2)×2, and

an inch corresponding to the diagonal length is

h=w×9/16

I=(w ² +h ²)^(1/2)=[(D×tan(a/2)×2)²+(D×tan(a/2)×2×9/16)²]^(1/2)

It was known that a human vision has a view of horizontal 160 degreesand vertical 175 degrees when only one eye is opened and a view ofhorizontal 200 degrees and vertical 135 degrees when both eyes areopened, and a viewing angle overlapped when both eyes are opened ishorizontal 120 degrees and vertical 135 degrees. That is, viewing whenthe both eyes are opened means that only an object within horizontal 120degrees may be distinguished, and since a viewing angle which may befocused within the 120 degrees is about 30 degrees, generally, assumingthat a viewing angle when the user views the display is 30 degrees, anequation is summarized as follows.

D=1.6264I(inch is converted to cm to be substituted; Unit: cm)

An ability of the human to discern objects is expressed by angleresolution. The angle resolution indicates the number of pairs of blacklines and white lines which may be distinguished within a range of 1degree, and a pair of black and white lines is called one cycle andexpressed as cycle per degree (CPD) (FIG. 12). The CPD represents thenumber of cycles which exist in a width w corresponding to a viewingangle range of 1 degree at a distance far away by D as described below,and it is known that 50 CPD, that is, 50 cycles are the limit of thehuman retina (FIG. 13).

A function according to a distance of the CPD is defined as D=w/tan (1degree/2)×2 according to a distance D as illustrated in FIG. 12, and inthis case, when the function is converted to an equation for w, w=2Dtan(0.5 degree)=0.01745D.

In this case, (the number of pixels comprised within a distance w×2) isjust a CPD value, and the upper limit and the lower limit which may bediscerned by the retina are 0.5 and 50, respectively.

Since this may be analyzed by a pair of pixels, finally, thecorresponding pixels correspond to 1 to 100, and when the inch equationaccording to the distance D is substituted to w=2D tan(0.5degree)=0.017456D, since D is 1.62641, the equation may be converted tow=0.02841 (cm).

Since values corresponding to the limit of the retina are P=w andP=w/100, when the values are converted to an inch and a pitch of thepixel, respectively, the following values are obtained.

1P=0.0284I→P=0.0142I (cm)

100P=0.0284I→P=0.00028I (cm).

Since a unit is cm, when the unit is converted to micrometer,

P=284I

P=2.81I (μm)

When I is substituted in the unit of an inch, if the equation is changedso that the pixel pitch is directly calculated,

P=111.8I

P=1.10I

The equation corresponds to a dotted region of FIG. 3 when representedin a graph.

However, all the regions may not be regions where the display ismanufactured, and the upper limit and the lower limit of the pixel pitchfor an inch of a display which is generally manufactured in current, anda pixel according to an inch of a display which is mainly manufacturedare represented by a red solid line and a blue solid line, and a blacksolid line of FIG. 3, respectively. In this case, when the pitch of thepixel according to an inch of a display which is mainly manufacturedwhich is represented by the black solid line is converted to the CPD,the pitch is converted to a CPD value of about 9.8, which may beunderstood as the meaning that a rule that about 20 pixels are arrangedwithin about 1 degree from a distance viewed by the viewer is followedand may correspond to a region near 8 which is a region where a visualfunction according to a CPD becomes maximum in FIG. 13.

In the present invention, the electric conducting line may beconstituted by straight lines, but may be variously modified by curvedlines, wave lines, zigzag lines, and the like. Further, the electricconducting line may have a mixed shape of at least two kinds of lineshaving the shapes.

In the present invention, the electric conducting pattern may comprisepolygonal patterns of three angles or more, for example, a triangle, aquadrangle, a pentagon, a hexagon, a heptagon or more, as cells closedby the electric conducting line.

In the present invention, the electric conducting pattern may comprise aregular pattern. Here, the regular pattern means that the shape of thepattern has regularity. For example, the electric conducting pattern maycomprise a pattern having a mesh shape such as a rectangle or a squareor a hexagon shape.

In order to prepare the aforementioned electric conducting pattern,first, after determining a desired pattern shape, the electricconducting pattern having a thin line width and precision may be formedon the transparent substrate by using a printing method, aphotolithography method, a photography method, a method using a mask, asputtering method, an inkjet method, or the like.

The printing method may be performed by transferring and firing a pastecomprising an electric conducting pattern material on the transparentsubstrate in a desired pattern shape. The transfer method is notparticularly limited, but the desired pattern may be transferred on thetransparent substrate by forming the pattern shape on a pattern transfermedium such as an intaglio or a screen and using the formed patternshape. A method of forming the pattern shape on the pattern transfermedium may use a known method in the art.

The printing method is not particularly limited and may use a printingmethod such as offset printing, screen printing, gravure printing, flexoprinting, and inkjet printing, and may use a complex method of one kindor more thereof. The printing method may use a roll to roll method, aroll to plate method, a plate to roll method, or a plate to platemethod.

In the present invention, in order to implement a precise electricconducting pattern, it is preferable to apply the reverse offsetprinting method. FIG. 6 illustrates a direct and indirect process usinga reverse offset printing method. Referring to FIG. 6, when etching isperformed on a silicon-based rubber called a blanket, a method offorming a desired pattern may be performed by coating ink capable ofserving as a resist throughout an area, primarily removing anunnecessary portion through an intaglio having a pattern which is calleda cliche, and secondarily transferring a print pattern remaining on theblanket to a film where metal and the like are deposited or a base suchas glass, and then firing and etching the transferred print pattern. Inthe case of using the method, as uniformity of a line height in theentire area is secured by using the base deposited with the metal, it isadvantageous that resistance in a thickness direction may be uniformlymaintained.

Another example to which the present invention may be applied uses agravure offset method as illustrated in FIG. 7. The gravure offsetprinting may be performed by filling a paste in the intaglio having thepattern, primarily transferring the paste to the blanket and thensecondarily transferring the paste by contacting the blanket and thetransparent substrate. In addition, the gravure printing may beperformed by a modified method of winding a blanket having the patternon a roll, filling a paste in the pattern, and then transferring thepattern to the transparent substrate. In the present invention, themethods may be used in combination, in addition to the methods. Further,other printing methods known to those skilled in the art, for example, ascreen printing method may also be used.

The present invention is not limited to the above printing methods andmay also use a photolithography process. For example, thephotolithography process may be performed by a method of forming anelectric conducting pattern material layer on the entire surface of thetransparent substrate, forming a photoresist layer thereon, patterningthe photoresist layer by a selective exposing and developing process,patterning an electric conducting pattern by using the patternedphotoresist layer as an etching resist and then, removing thephotoresist layer.

Further, the present invention may also use the photography method. Forexample, after a photosensitive material comprising silver halide iscoated on the transparent substrate, the pattern may also be formed byselectively exposing and developing the photosensitive material. A moredetailed example is as follows. First, a negative photosensitivematerial is coated on a base to form a pattern. In this case, as thebase, a polymer film such as PET and acetyl celluloid may be used. Here,a polymer film material member coated with the photosensitive materialis called a film. The negative photosensitive material may be generallyconstituted by silver halide obtained by mixing a little AgI with AgBrreacting to light very sensitively and regularly. Since an imageobtained by photographing and developing a general negativephotosensitive material is a negative image having an opposite contrastto that of a subject, the photographing may be performed by using a maskhaving a pattern shape to be formed, preferably, an irregular patternshape.

In order to increase electric conductivity of the electric conductingpattern formed by using the photolithography and photography processes,a plating process may further be performed. The plating may be performedby using an electroless plating method, a plating material may usecopper or nickel, and after copper plating is performed, nickel platingmay be performed thereon, but the scope of the present invention is notlimited thereto.

Further, the present invention may also use a method using a hard mask.For example, after a mask having a desired electric conducting patternshape is positioned close to a base, the electric conducting patternmaterial may be deposited on the base to be patterned. In this case, thedeposition method may use a heat deposition method by heat or electronbeam, a physical vapor deposition (PVD) method such as sputtering, and achemical vapor deposition (CVD) method using an organometal material.

Further, the present invention may be manufactured by an imprintingprocess. The imprinting process may use a method of coating animprintable resin on a base deposited with electric conducting metal andthe like, printing the coated resin by using a prepared mold pattern,patterning a metal line through dry etching and etching processes,removing the resin or patterning the resin for imprinting through amold, partially filling an electric conducting material between thepatterns, and then using the filled electric conducting material ortransferring the filled electric conducting material to another base.

In the present invention, the electric conducting pattern may comprisean electric conducting line having a line width of 20 micrometers orless, and may comprise an electric conducting line having a line widthof 15 micrometers or less, 10 micrometers or less, 7 micrometers orless, 4 micrometers or less, or 3 micrometers or less. In the presentinvention, the line width of the electric conducting line may becontrolled within the range of 0.5 to 10 micrometers.

In the present invention, an aperture ratio of a third electricconducting pattern, that is, an area ratio of the transparent substratewhich is not covered by the pattern is preferably 70% or more, and maybe 90% or more, 93% or more, 95% or more, 96% or more, 97% or more, 98%or more, or 99% or more.

According to an exemplary embodiment of the present invention, theconductor may comprise a region where the electric conducting pattern isnot formed.

According to an exemplary embodiment of the present invention, theelectric conducting pattern may be blackened. As a result, even in thecase where the electric conducting pattern is made of a metallicmaterial, visibility may be further reduced. In the case of forming apattern by directly printing an electric conducting pattern, in order toblacken the electric conducting pattern, a blackening process isperformed after adding a blackening material to a paste or ink forforming the electric conducting pattern, or printing and firing thepaste or ink to blacken the electric conducting pattern.

The blackening material which may be added to the ink or the pastecomprises metal oxide, carbon black, carbon nanotube, black pigment,colored glass flit, and the like. The blackening after firing may beperformed by immersing in an oxidation solution, for example, a solutioncontaining a Fe or Cu ion, immersing in a solution containing a halogenion such as a chlorine ion, immersing in peroxide, nitrate, and thelike, and a treatment with halogen gas, or the like, in the case wherethe ink or the paste is an Ag based material.

In the case of a method of forming the pattern through etching, not amethod of directly printing a metallic material, another example of theblackening may use a method of depositing a blackening layer on asurface viewed by a person, depositing a layer for providing electricconductivity thereon, and patterning the layers at once during asubsequent etching process. As an example, in the case of depositing theblackening layer through MoOxNy, depositing an Al layer thereon, andprinting and etching resist ink on the base, MoOxNy and Al aresimultaneously patterned in an etchant such as a mixed solution ofphosphoric acid, nitric acid, acetic acid, and water and thus a desiredsurface is blackened.

In the present invention, the transparent substrate is not particularlylimited, but light transmittance thereof is 50% or more, preferably 75%or more, and more preferably 88% or more. In detail, the transparentsubstrate may use glass, a plastic substrate, or a plastic film. Theplastic substrate or film may use a material which is known in the art,for example, a material made of one or more kinds of resins selectedfrom polyacryls, polyurethanes, polyesters, polyepoxies, polyolefins,polycarbonates, and celluloses. In more detail, the plastic substrate orfilm is preferably a film having visible-light transmittance of 80% ormore, such as polyethylene terephthalate (PET), polyvinylbutyral (PVB),polyethylene naphthalate (PEN), polyethersulfon (PES), polycarbonate(PC), and acetyl celluloid. A thickness of the plastic film ispreferably 12.5 to 500 micrometers, more preferably 50 to 450micrometers, and much more preferably 50 to 250 micrometers. The plasticsubstrate may be a substrate having a structure in which variousfunctional layers, such as a gas barrier layer for blocking moisture andgas and a hard coat layer for reinforcing strength, improvingtransmittance, and decreasing a haze value, are laminated on one side orboth sides of the plastic film. The functional layers which may becomprised in the plastic substrate are not limited to the aforementionedlayers, and various functional layers may be provided.

The electric conducting pattern may be directly formed on a component,for example, a substrate comprised in an element or a device to whichthe electric conducting substrate of the present invention may beapplied, such as a display, a touch panel, and an OLED illumination.

In the present invention, as the electric conducting pattern material, ametal having excellent electric conductivity may be used. Further, aspecific resistance value of the electric conducting pattern material ispreferably 1 microOhm cm or more and 100 microOhm or less, and morepreferably 1 microOhm cm or more and 5 microOhm or less. As a detailedexample of the electric conducting pattern material, aluminum, copper,silver, gold, iron, molybdenum, nickel, carbon nanotube (CNT), titanium,and an alloy thereof or oxide, nitride or oxynitride thereof, or thelike may be used. However, aluminum is most preferable from theviewpoint of costs and electric conductivity. The electric conductingpattern material may be converted and used into a particle form in thecase of directly printing, and in this case, the particle form may beparticles having a single composition or a mixed composition of themetals enumerated above.

In the present invention, in the case of using ink or a paste comprisingthe electric conducting pattern material, the ink or the paste mayfurther comprise an organic binder in addition to the aforementionedelectric conducting pattern material in order to facilitate the printingprocess. The organic binder may have volatility during a firing process.The organic binder may comprise a polyacrylic resin, a polyurethaneresin, a polyester resin, a polyolefin resin, a polycarbonate resin, acellulose resin, a polyimide resin, a polyethylene naphthalate resin, amodified epoxy, and the like, but is not just limited thereto.

The electric conducting substrate according to the present invention maybe connected to a power source, and in this case, a resistance value perunit area considering an aperture ratio is 0.01 ohm/square to 1,000ohm/square and preferably 5 ohm/square to 150 ohm/square at roomtemperature.

The electric conducting substrate according to the present invention maybe used to conduct current or apply voltage by external factors inaddition to a configuration of the electric conducting substrate itself.The electric conducting substrate according to the present invention maybe variously used for a use of requiring electric conductivity. Forexample, the electric conducting substrate according to the presentinvention may be used for an electromagnetic shielding film, a touchpanel, an auxiliary electrode for a light emitting element, an auxiliaryelectrode for a solar cell, and the like. In detail, the auxiliaryelectrode for a light emitting element may be an auxiliary electrode foran organic light emitting diode (OLED) illumination.

According to an exemplary embodiment of the present invention, anelectronic device comprising the aforementioned electric conductingsubstrate of the present invention is provided. The electronic devicemay further comprise a display pixel substrate provided on at least oneside of the electric conducting substrate, and each pixel of the displaypixel substrate may comprise two or more subpixels. In this case, eachpixel of the display pixel substrate may comprise three or foursubpixels.

The electronic device may be a touch panel, an OLED illumination, anorganic solar cell.

Further, according to an exemplary embodiment of the present invention,a display device comprising the aforementioned electric conductingsubstrate of the present invention is provided. The touch panelaccording to the present invention may comprise a lower base; an upperbase; and an electrode layer provided on any one surface or bothsurfaces of a surface of the lower base contacting the upper base and asurface of the upper base contacting the lower base. The electrode layermay perform a function for detecting an X-axial position and a Y-axialposition, respectively.

In this case, one or both of an electrode layer provided on the lowerbase and the surface of the lower base contacting the upper base; and anelectrode layer provided on the upper base and the surface of the upperbase contacting the lower base may be the aforementioned electricconducting substrate according to the present invention. In the casewhere only any one of the electrode layers is the electric conductingsubstrate according to the present invention, the other electrode layermay have a pattern known in the art.

In the case where the electrode layers are provided on sides of both theupper base and the lower base to form a two-layered electrode layer, aninsulating layer or a spacer may be provided between the lower base andthe upper base so that a distance between the electrode layers isuniformly maintained and the electrode layers are not connected to eachother. The insulating layer may comprise an adhesive or a UV orthermosetting resin. The touch panel may further comprise a ground partconnected with the aforementioned electric conducting pattern. Forexample, the ground part may be formed at an edge of the surface withthe electric conducting pattern of the transparent substrate.

Further, at least one of an anti-reflective film, a polarization film,and an anti-fingerprinting film may be provided on at least one side ofthe electric conducting substrate. According to a design specification,different kinds of functional films may be further comprised in additionto the aforementioned functional films. The touch panel may be appliedto display apparatuses such as an OLED display panel (PDP), a liquidcrystal display (LCD), a cathode-ray tube (CRT), and a PDP.

The touch panel according to the present invention is not limited to theabove structure, and comprises a structure in which both a firstelectrode and a second electrode are formed on one base, or a structurein which an electrode layer of the lower base is laminated on a surfacewhere the electrode layer of the upper base is not provided.

According to an exemplary embodiment of the present invention, anauxiliary electrode for an OLED illumination comprising theaforementioned electric conducting substrate of the present inventionand an OLED illumination comprising the same are provided. As oneexample, the OLED illumination according to the present inventioncomprises a first electrode, an auxiliary electrode disposed on thefirst electrode, an insulating layer disposed on the auxiliaryelectrode, at least one organic material layer, and a second electrode,and the auxiliary electrode may be the electric conducting patternaccording to the present invention. The auxiliary electrode may bedirectly formed on the first electrode, and the electric conductingsubstrate comprising the transparent substrate and the electricconducting pattern may be positioned on the first electrode.

Further, another exemplary embodiment of the present invention providesan auxiliary electrode of an organic solar cell adopting a structurewhich is the same as or similar to the auxiliary electrode for the OLEDillumination and an organic solar cell comprising the same.

Hereinafter, preferable Examples for understanding the present inventionwill be described. However, the following Examples just exemplify thepresent invention, and the scope of the present invention is not limitedto the following Examples.

Example 1

After depositing Al metal on a polyethylene terephthalate (PET) base, astripe pattern having a line width of 2.7 μm was formed through aprinting process, and the electric conducting pattern was formed throughetching and releasing processes.

Comparative Example 1

After depositing Al metal on a PET base, a stripe pattern having a linewidth of 10 μm was formed through a printing process and then a samplewas formed through etching and releasing processes.

The electric conducting pattern according to Example 1 was illustratedin the following FIG. 8, and the electric conducting pattern accordingto Comparative Example 1 was illustrated in the following FIG. 9. Fromthe results of FIGS. 8 and 9, it can be seen that the electricconducting pattern having a line width which is 3% more than a pixelpitch of the display had a bad visibility characteristic.

Examples 2 to 10 and Comparative Examples 2 to 10

As illustrated in the following Table 1, after evaluating a length(inch) of a diagonal of an effective screen part of the display, a pixelpitch of the display, a pitch and a line width of a metal mesh pattern,application conformance or not according to the evaluated result wasevaluated.

TABLE 1 2 4 6 1 Display 3 Mesh Visible 7 Display Pixel Mesh Physicalline Application 8 (inch) Pitch Pitch line width width conformance NoteExample 2 3.5 77 120 2.3 867 nm OK Comparative 3.5 77 300 5 4.5 μm NG 3,4, 6 Example 2 Nonconformance Example 3 4 100 120 2.8 900 nm OKComparative 4 100 310 8 2.4 μm NG 3, 4 Example 3 Nonconformance Example4 7.9 156 200 3 1.2 μm OK Comparative 7.9 156 200 7 6.3 μm NG 4, 6Example 4 Nonconformance Example 5 10.1 170 250 3.3 990 nm OKComparative 10.1 170 250 5.4 1.62 μm NG 4 Example 5 nonconformanceExample 6 13.3 224 250 2.3 460 nm OK Comparative 13.3 224 500 2.3 460 nmNG 3 Example 6 nonconformance Example 7 21.5 248 250 5.4 1.62 μm OKComparative 21.5 248 250 5.4 4.86 μm NG 6 Example 7 nonconformanceExample 8 23 265 500 7 2.1 μm OK Comparative 23 265 810 8 2.4 μm NG 3, 4Example 8 nonconformance Example 9 27 311 300 3.3 990 nm OK Comparative27 311 300 10 3 μm NG 4 Example 9 nonconformance Example 10 42 484 400 3900 nm OK Comparative 42 484 400 7 6.3 μm NG 6 Example 10 nonconformance

Examples 11 and 12 and Comparative Examples 11 and 12

As illustrated in the following Table 2, bright room reflectivity and avisible line width of the electric conducting pattern were evaluated.

TABLE 2 Comparative Example Comparative Example Classification Example11 11 Example 12 12 Mesh constituent Bare Al Cr/CrOX Al Cr/CrOX materialand (LCM Off 250 μm 250 μm 300 μm 300 μm mesh pitch state) Display inch/10.1/ 10.1/ 10.1/ 10.1/ 10.1/ pixel pitch 170 μm 170 μm 170 μm 170 μm170 μm Reflectivity of — 0.92 0.2 0.92 0.2 material Physical line — 5 μm5 μm 5 μm 5 μm width Visible line — 4.6 μm 660 nm 4.6 μm 1.65 μm widthBright room 0.11 0.14137 0.112 0.13535 0.1083 reflectivity in LCM Offstate |Bright room 0 0.28 0.018 0.23 0.015 reflectivity in LCM Offstate/ Bare) − 1| = b

1-24. (canceled)
 25. An electric conducting substrate, comprising: atransparent substrate; and an electric conducting pattern comprising anelectric conducting line provided on the transparent substrate, whereinthe electric conducting pattern comprises cells closed by the electricconducting line, a characteristic length (Lc) of the cells defined by a0.5-squared value of an area of the cell satisfies the following Formula3, and a visible line width (W_(v)) of the electric conducting linesatisfies the following Formula 12:Y ₁ /n≦Lc≦2Y ₂  [Formula 3] in Formula 3, n is the number of subpixelsarranged in one direction in each pixel of the display to which theelectric conducting substrate is applied, and Y₁ and Y₂ are representedby the following formulas, respectively,Y ₁=(2.9Q+68.1)×1 μm/1 inchY ₂=(13.3Q+98.1)×1 μm/1 inch in the formulas, Q is a diagonal length(inch) of an effective screen part of the display to which the electricconducting substrate is applied,W _(v) =W×R _(m)  [Formula 12] in Formula 12, W is a line width of theelectric conducting line, R_(m) is reflectivity of an electricconducting line material configuring the electric conducting pattern.26. An electric conducting substrate, comprising: a transparentsubstrate; and an electric conducting pattern comprising an electricconducting line provided on the transparent substrate, wherein theelectric conducting pattern comprises cells closed by the electricconducting line, a characteristic length (Lc) of the cells defined by a0.5-squared value of an area of the cell satisfies the following Formula4:Lp/n≦Lc≦2Lp  [Formula 4] in Formula 4, n is the number of subpixelsarranged in one direction in each pixel of the display to which theelectric conducting substrate is applied, and Lp is a characteristiclength of the pixel defined by a 0.5-squared value of an area of eachpixel of the display to which the electric conducting substrate isapplied.
 27. The electric conducting substrate of claim 26, wherein acharacteristic length Lc of the cells satisfies the following Formula 5:P _(pixel 1) /n≦Lc≦2P _(pixel 2)  [Formula 5] in Formula 5, n is thenumber of subpixels arranged in one direction in each pixel of thedisplay to which the electric conducting substrate is applied, andP_(pixel 1) is a pitch of a short width of each pixel of the display towhich the electric conducting substrate is applied, and P_(pixel 2) is apitch of a long width of each pixel of the display to which the electricconducting substrate is applied.
 28. An electric conducting substrate,comprising: a transparent substrate; and an electric conducting patterncomprising an electric conducting line provided on the transparentsubstrate, wherein a line width (W) of the electric conducting linesatisfies the following Formula 6:0.03Y ₃ ≧W  [Formula 6] in Formula 6, W is a line width of the electricconducting line, and Y₃ is a real number within a range of Y₁≦Y₃≦Y₂, andhere, Y₁ and Y₂ are represented by the following formulas, respectively,Y ₁=(2.9Q+68.1)×1 μm/1 inchY ₂=(13.3Q+98.1)×1 μm/1 inch in the formulas, Q is a diagonal length(inch) of an effective screen part of the display to which the electricconducting substrate is applied.
 29. An electric conducting substrate,comprising: a transparent substrate; and an electric conducting patterncomprising an electric conducting line provided on the transparentsubstrate, wherein a line width (W) of the electric conducting linesatisfies the following Formula 7:0.03Lp≧W  [Formula 7] in Formula 7, W is a line width of the electricconducting line, and Lp is a characteristic length of the pixel definedby a 0.5-squared value of an area of each pixel of the display to whichthe electric conducting substrate is applied.
 30. The electricconducting substrate of claim 29, wherein a line width (W) of theelectric conducting line satisfies the following Formula 8:0.03P _(pixel) ≧W  [Formula 8] in Formula 8, W is a line width of theelectric conducting line, and P_(pixel) is a pitch of each pixel of thedisplay to which the electric conducting substrate is applied.
 31. Anelectric conducting substrate, comprising: a transparent substrate; andan electric conducting pattern comprising an electric conducting lineprovided on the transparent substrate, wherein a line width (W) of theelectric conducting line satisfies the following Formula 9:3Y ₃/(100×10^(1/2))≧W  [Formula 9] in Formula 9, W is a line width ofthe electric conducting line, and Y₃ is a real number (μm) within arange of Y₁≦Y₃≦Y₂, and here, Y₁ and Y₂ are represented by the followingformulas, respectivelyY ₁=(2.9Q+68.1)×1 μm/1 inchY ₂=(13.3Q+98.1)×1 μm/1 inch in the formulas, Q is a diagonal length(inch) of an effective screen part of the display to which the electricconducting substrate is applied.
 32. An electric conducting substrate,comprising: a transparent substrate; and an electric conducting patterncomprising a electric conducting line provided on the transparentsubstrate, wherein a line width (W) of the electric conducting linesatisfies the following Formula 10:3Lp/(100×10^(1/2))≧W  [Formula 10] in Formula 10, W is a line width ofthe electric conducting line, and Lp is a characteristic length (μm) ofthe pixel defined by a 0.5-squared value of an area of each pixel of thedisplay to which the electric conducting substrate is applied.
 33. Theelectric conducting substrate of claim 32, wherein a line width (W) ofthe electric conducting line satisfies the following Formula 11:3P _(pixel)(100×10^(1/2))≧W  [Formula 11] in Formula 11, W is a linewidth of the electric conducting line, and P_(pixel) is a pitch of eachpixel of the display to which the electric conducting substrate isapplied.
 34. An electric conducting substrate, comprising: a transparentsubstrate; and an electric conducting pattern comprising an electricconducting line provided on the transparent substrate, wherein a visibleline width (W_(v)) of the electric conducting line satisfies thefollowing Formula 12 and is more than 0 to 3.6 μm or less:W _(v) =W×R _(m)  [Formula 12] in Formula 12, W is a line width of theelectric conducting line, and R_(m) is reflectivity of an electricconducting line material configuring the electric conducting pattern.35. The electric conducting substrate of claim 34, wherein bright roomreflectivity of a display panel in a display off mode to which theelectric conducting pattern is applied is 0.11 or less.
 36. The electricconducting substrate of claim 34, wherein in the case of beingindistinguishable by naked eyes, bright room reflectivity of a displaypanel with the electric conducting pattern in the display off mode is b₁bright room reflectivity of only a display panel where the electricconducting pattern is not provided in the display off mode is b₀, and anabsolute value of [b₁/b₀−1] is 0.03 or less.
 37. The electric conductingsubstrate of claim 34, wherein in the case of being indistinguishable bynaked eyes, bright room reflectivity of a display panel with theelectric conducting pattern in the display off mode is b₁ bright roomreflectivity of only a display panel where the electric conductingpattern is not provided in the display off mode is b₀, and an absolutevalue of [b₁/b₀−1] is 0.115 or less.
 38. An electronic device comprisingthe electric conducting substrate of claim
 26. 39. The electronic deviceof claim 38, further comprising: a display pixel substrate provided onat least one side of the electric conducting substrate, wherein eachpixel of the display pixel substrate comprises two or more subpixels.40. The electronic device of claim 39, wherein each pixel of the displaypixel substrate comprises three or four subpixels.
 41. The electronicdevice of claim 38, wherein the electronic device is a touch panel, anorganic light emitting diode illumination, or an organic solar cell. 42.A display device comprising the electric conducting substrate of claim26.
 43. The electric conducting substrate of claim 25, wherein thevisible line width (W_(v)) of the electric conducting line satisfies thefollowing Formula 13:0≦a×(W−b×P _(pixel))≦W _(v) ≦a×(W+b×P _(pixel))  [Formula 13] in Formula13, W is a line width of the electric conducting line, P_(pixel) is apitch of a pixel of the display, a is a bright room reflectivity of thedisplay panel in a display off mode, and b is an absolute value of[b₁/b₀−1], b₁ is a bright room reflectivity of a display panel with theelectric conducting pattern in the display off mode, and b₀ is a brightroom reflectivity of only a display panel where the electric conductingpattern is not provided in the display off mode.
 44. The electricconducting substrate of claim 25, wherein the visible line width (W_(v))of the electric conducting line is more than 0 to 3.6 μm or less.